Optimized measurements of planarity of the nanostructure surfaces

Please use this identifier to cite or link to this item: http://essuir.sumdu.edu.ua/handle/123456789/27596

Or use following links to share this resource in social networks: Recommend this item

Title	Optimized measurements of planarity of the nanostructure surfaces
Authors	Holovchenko, A.I.
ORCID
Keywords
Type	Conference Papers
Date of Issue	2012
URI	http://essuir.sumdu.edu.ua/handle/123456789/27596
Publisher	Видавництво СумДУ
License
Citation	Holovchenko, A.I. Optimized measurements of planarity of the nanostructure surfaces [Текст] / A.I. Holovchenko ; Supervisor T.J. Kippenberg // Фізика, електроніка, електротехніка : матеріали та програма науково-технічної конференції, м. Суми, 16-21 квітня 2012 р. / Відп. за вип. С.І. Проценко. - Суми : СумДУ, 2012. - C. 61.
Abstract	In micro- nanofabrication planarity of the surfaces is the key of successful process flow. Defects, caused by processes such as etching, inhomogeneity caused either deposition or sputtering can be detected via special metrology techniques and tools. Detection can be done in two ways: by a digital image comparison technique or by laser scanning technology. Noticeable, that both techniques are used in industry and science. Laser scattering tool mostly destined for blank monitor wafers, as image comparison is for patterned wafers. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/27596
Appears in Collections:	Наукові видання (ЕлІТ)