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Title Changing of defect’s structure and properties of superhard nanostructured Ti-Si-N coatings, fabricated using CPVD, before and after annealing
Authors Pohrebniak, Oleksandr Dmytrovych  
Bondar, Oleksandr Viacheslavovych  
Bondarenko, Oleksandr Viacheslavovych
Соболь, О.В.
Sobol, O.V.
Береснев, В.М.
Beresnev, V.M.
Keywords Nanostructure
Wear
Nanohardness
Profiles of Defects
Ti-Si-N
Type Article
Date of Issue 2013
URI http://essuir.sumdu.edu.ua/handle/123456789/33948
Publisher Scientific Research
License
Citation Changing of defect’s structure and properties of superhard nanostructured Ti-Si-N coatings, fabricated using CPVD, before and after annealing [Текст] / O.D. Pohrebniak, O.V. Bondar, O.V. Sobol, V.M. Beresnev // Soft Nanoscience Letters. — 2013. — №3. — P. 46-51
Abstract Using such unique methods of analysis as slow positron beam (SPB), RBS, μ-PIXE (proton microbeam), XRD, SEM with EDS, XPS, nanohardness and elastic modulus measurements, we studied superhard nanostructure Ti-Si-N coatings, which were deposited using Cathodic-PVD method, before and after annealing at the temperature of 600°C for 30 minutes. It is shown in the paper that redistribution of N and Si occurs on the borders of nanograins after annealing, amorphous phase α-SiNx (Si3N4) is created, defects segregates on interfaces and forms vacancy-type clusters with rather high concentration from 5 × 10[16] cm-3 to 7.5 × 10[17] cm-3 due to thermodiffusion. Solid solution (Ti,Si)N and small concentration of α-SiN (close to XRD detection limits) are formed in the coating. Also it was obtained, that deflected mode is formed in the coating (compressive deformation equals to –2.6%), but after thermal annealing deformation reduces to a value of -2.3%. Size of nanograins of solid solution (Ti, Si)N increases from 12.5 nm to (13.2 ÷ 13.4) nm. 25 nm size grains increase their size to 28.5 nm after annealing (under another deposition regime). When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/33948
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