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Title Managing the Composition of the Plasma Flow of the Technological Plasma Sources by Changing the Temperature of the Cathode Working Surface
Authors Sysoev, Yu.
Tatarkina, I.
Keywords Plasma source
Cathode working surface temperature
Vacuum arc
Dripping fraction
Type Conference Papers
Date of Issue 2013
URI http://essuir.sumdu.edu.ua/handle/123456789/35599
Publisher Sumy State University
License
Citation Sysoev, Yu. Managing the Composition of the Plasma Flow of the Technological Plasma Sources by Changing the Temperature of the Cathode Working Surface [Текст] / Yu. Sysoev, I. Tatarkina // Nanomaterials: Applications & Properties (NAP-2013) : 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy: Sumy State University, 2013. - V.2, No3. - 03AET02
Abstract The problems of managing the amount of drop fraction in the plasma flow of technological plasma vac-uum-arc discharge sources by controlling the changing the cathode surface temperature were considered. The possibilities for regulation and stabilization of cathode surface temperature by cooling the front and the lateral cathode surface were investigated. Designs of cathode assemblies in which the control of tem-perature of the working surface cathode is exercised by changing the coolant flow rate and by changing dis-tance between the cathode working surface and its cooling area were developed. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35599
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China China
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Lithuania Lithuania
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United States United States
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