Please use this identifier to cite or link to this item: http://essuir.sumdu.edu.ua/handle/123456789/35630
Title: Immersion Lithography with Using of Photostimulated Etching of Germanium Chalcogenide Films
Authors: Danko, V.A.
Indutnyi, I.Z.
Mynko, V.I.
Shepeliavyi, P.E.
Lykanyuk, M.V.
Litvin, O.S.
Keywords: Chalcogenide Glasses
Photo-induced Dissolution
Issue Year: 2013
Publisher: Sumy State University
Citation: Immersion Lithography with Using of Photostimulated Etching of Germanium Chalcogenide Films [Текст] / V.A. Danko, I.Z. Indutnyi, V.I. Mynko et al. // Nanomaterials: Applications & Properties (NAP-2013): 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy: Sumy State University, 2013. - V.2, No3. - 03AET03
Abstract: The new effect of photo-stimulated dissolution of as-evaporated and annealed Ge-based chalcogenide glass (ChG) films was investigated. The etching rate increases with the illumination intensity, and its spectral dependence is correlated with absorption in the film at the absorption edge. The high-frequency diffraction gratings on germanium ChG - more environmentally acceptable compounds than traditionally used arsenic chalcogenides, were recorded by method of interference immersion photolithography with photoinduced etching. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35630
URI: http://essuir.sumdu.edu.ua/handle/123456789/35630
Type: Conference Papers
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