Immersion Lithography with Using of Photostimulated Etching of Germanium Chalcogenide Films

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Title	Immersion Lithography with Using of Photostimulated Etching of Germanium Chalcogenide Films
Authors	Danko, V.A. Indutnyi, I.Z. Mynko, V.I. Shepeliavyi, P.E. Lykanyuk, M.V. Litvin, O.S.
ORCID
Keywords	Chalcogenide Glasses Photo-induced Dissolution
Type	Conference Papers
Date of Issue	2013
URI	http://essuir.sumdu.edu.ua/handle/123456789/35630
Publisher	Sumy State University
License	Copyright not evaluated
Citation	Immersion Lithography with Using of Photostimulated Etching of Germanium Chalcogenide Films [Текст] / V.A. Danko, I.Z. Indutnyi, V.I. Mynko et al. // Nanomaterials: Applications & Properties (NAP-2013): 2-nd International conference, Alushta, the Crimea, September 17-22, 2012 / Edited by: A. Pogrebnjak. - Sumy: Sumy State University, 2013. - V.2, No3. - 03AET03
Abstract	The new effect of photo-stimulated dissolution of as-evaporated and annealed Ge-based chalcogenide glass (ChG) films was investigated. The etching rate increases with the illumination intensity, and its spectral dependence is correlated with absorption in the film at the absorption edge. The high-frequency diffraction gratings on germanium ChG - more environmentally acceptable compounds than traditionally used arsenic chalcogenides, were recorded by method of interference immersion photolithography with photoinduced etching. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35630
Appears in Collections:	Наукові видання (ЕлІТ)