Please use this identifier to cite or link to this item: http://essuir.sumdu.edu.ua/handle/123456789/36380
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Title RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells
Authors Zakhvalinskii, V.S.
Piljuk, E.A.
Goncharov, I.Yu.
Rodriges, V.G.
Kuzmenko, A.P.
Taranenko, S.V.
Abakumov, P.A.
Keywords Atomic force microscopy
RF- magnetron sputtering
Silicon carbide
Silicon nitride
Thin films
Solar cells
Type Article
Date of Issue 2014
URI http://essuir.sumdu.edu.ua/handle/123456789/36380
Publisher Sumy State University
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Citation RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type.
Abstract RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/36380
Appears in Collections: Журнал нано- та електронної фізики (Journal of nano- and electronic physics)

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