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Title | RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells |
Authors |
Zakhvalinskii, V.S.
Piljuk, E.A. Goncharov, I.Yu. Rodriges, V.G. Kuzmenko, A.P. Taranenko, S.V. Abakumov, P.A. |
ORCID | |
Keywords |
Atomic force microscopy RF- magnetron sputtering Silicon carbide Silicon nitride Thin films Solar cells |
Type | Article |
Date of Issue | 2014 |
URI | http://essuir.sumdu.edu.ua/handle/123456789/36380 |
Publisher | Sumy State University |
License | |
Citation | RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based on substrates of single crystal silicon of p-type. |
Abstract |
RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used
for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based
on substrates of single crystal silicon of p-type.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/36380 |
Appears in Collections: |
Журнал нано- та електронної фізики (Journal of nano- and electronic physics) |
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File | Size | Format | Downloads |
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RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells.pdf | 514.03 kB | Adobe PDF | 211232446 |
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