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Title | Perspective Method of Betavoltaic Converter Creation |
Authors |
Rudenko, K.V.
Miakonkih, A.V. Rogojin, A.E. Bogdanov, S.V. Lelekov, E.T. Sidorov, V.G. Zelenkov, P.V. |
ORCID | |
Keywords |
Betavoltaic element p-i-n diode Plasma-immersion ion implantation Cryo process Scalloping |
Type | Article |
Date of Issue | 2016 |
URI | http://essuir.sumdu.edu.ua/handle/123456789/45503 |
Publisher | Sumy State University |
License | |
Citation | K.V. Rudenko, A.V. Miakonkih, A.E. Rogojin, et al., J. Nano- Electron. Phys. 8 No 2, 02022 (2016) |
Abstract |
Some results on planar diode structure creation by the method of a plasma-immersion ion implantation is presented in this paper. Obtained leakage current ~ 1 uA/cm2 at reverse voltage – 1 V. The cryogenic plasmochemical silicon etching process is developed, able to form the structured silicon layer with system of deep holes with high aspect ratio. |
Appears in Collections: |
Журнал нано- та електронної фізики (Journal of nano- and electronic physics) |
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File | Size | Format | Downloads |
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Rudenko, Miakonkih, Rogojin.pdf | 368,82 kB | Adobe PDF | 30947617 |
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