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Title The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase
Authors Ivashchenko, V.I.
Sobol, O.V.
Rogoz, V.N.
Pohrebniak, Oleksandr Dmytrovych  
Meilekhov, A.A.
Dub, S.N.
Kupchishin, A.I.
Keywords nanocomposite films
intermetallic nitride
magnetron sputtering
Type Article
Date of Issue 2015
URI http://essuir.sumdu.edu.ua/handle/123456789/46105
Publisher Pleiades Publishing, Ltd
License
Citation The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase [Text] / V.I. Ivashchenko, A.D. Pogrebnjak, O.V. Sobol [et al.] // Technical Physics Letters. — 2015. — №41(7). — С. 697-700.
Abstract Nanocomposite films based on (Nb2Al)N intermetallic nitride have been obtained by the method of magnetron sputtering. Xray diffraction analysis revealed two stable states of the crystalline structure: (i) NbN with low amount (within 5 at %) of dissolved Al in a composition close to (Nb2Al)N and (ii) an amor phous component related to aluminum nitride formed by reactive magnetron sputtering. The substructural characteristics (grain size and microdeformation level) are sensitive to the current via Al target and exhibit correlation with nanohardness and Knoop hardness of the film, which vary within 29–33.5 and 46–48 GPa, respectively.
Appears in Collections: Наукові видання (ЕлІТ)

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