|Title||The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase|
Pohrebniak, Oleksandr Dmytrovych
|Date of Issue||2015|
|Publisher||Pleiades Publishing, Ltd|
|Citation||The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase [Text] / V.I. Ivashchenko, A.D. Pogrebnjak, O.V. Sobol [et al.] // Technical Physics Letters. — 2015. — №41(7). — С. 697-700.|
Nanocomposite films based on (Nb2Al)N intermetallic nitride have been obtained by the method
of magnetron sputtering. Xray diffraction analysis revealed two stable states of the crystalline structure: (i)
NbN with low amount (within 5 at %) of dissolved Al in a composition close to (Nb2Al)N and (ii) an amor
phous component related to aluminum nitride formed by reactive magnetron sputtering. The substructural
characteristics (grain size and microdeformation level) are sensitive to the current via Al target and exhibit correlation with nanohardness and Knoop hardness of the film, which vary within 29–33.5 and 46–48 GPa, respectively.
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Наукові видання (ЕлІТ)
|Amorphous_Ivashchenko.pdf||163,74 kB||Adobe PDF||47839|
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