The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase

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Title	The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase
Authors	Ivashchenko, V.I. Sobol, O.V. Rogoz, V.N. Pohrebniak, Oleksandr Dmytrovych Meilekhov, A.A. Dub, S.N. Kupchishin, A.I.
ORCID	http://orcid.org/0000-0002-9218-6492
Keywords	nanocomposite films intermetallic nitride magnetron sputtering
Type	Article
Date of Issue	2015
URI	http://essuir.sumdu.edu.ua/handle/123456789/46105
Publisher	Pleiades Publishing, Ltd
License	Copyright not evaluated
Citation	The effect of Al target current on the structure and properties of (Nb2Al)N films with an amorphous AlN phase [Text] / V.I. Ivashchenko, A.D. Pogrebnjak, O.V. Sobol [et al.] // Technical Physics Letters. — 2015. — №41(7). — С. 697-700.
Abstract	Nanocomposite films based on (Nb2Al)N intermetallic nitride have been obtained by the method of magnetron sputtering. Xray diffraction analysis revealed two stable states of the crystalline structure: (i) NbN with low amount (within 5 at %) of dissolved Al in a composition close to (Nb2Al)N and (ii) an amor phous component related to aluminum nitride formed by reactive magnetron sputtering. The substructural characteristics (grain size and microdeformation level) are sensitive to the current via Al target and exhibit correlation with nanohardness and Knoop hardness of the film, which vary within 29–33.5 and 46–48 GPa, respectively.
Appears in Collections:	Наукові видання (ЕлІТ)