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Title Thin overlayer influence on electrophysical properties of nickel films
Authors Chornous, Anatolii Mykolaiovych  
Hovorun, Tetiana Pavlivna  
ORCID http://orcid.org/0000-0002-5009-5445
http://orcid.org/0000-0002-9384-5250
Keywords thin films
resistivity
reflection coefficient
тонкі плівки
питомий опір
коефіцієнт відбиття
тонкие пленки
удельное сопротивление
коэффициент отражения
Type Article
Date of Issue 2006
URI http://essuir.sumdu.edu.ua/handle/123456789/583
Publisher WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
License
Citation Hovorun T. Thin overlayer influence on electrophysical properties of nickel films [Text] / T. Hovorun, A. Chornous // Cryst. Res. Technol. 41, No 5, 458 - 463 (2006).
Abstract In this work it is experimentally investigated a size effect in temperature coefficient of resistance (TCR) of Ni films with Cu and Si02 thin overiayer. The parameters of electrical transfer (the mean-free path of electron, the reflectivity coefficient of the external surfaces, the reflection and transmission coefficients at the grain boundary) were calculations. Decreasing of the value of the reflectivity coefficient is due to the change of the surface microrelief. It is show that the value of TCR decreases caused by the conditions of scattering changes on internal and external boundaries. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/583
Appears in Collections: Наукові видання (ЕлІТ)

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