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Title | Thin overlayer influence on electrophysical properties of nickel films |
Authors |
Chornous, Anatolii Mykolaiovych
Hovorun, Tetiana Pavlivna |
ORCID |
http://orcid.org/0000-0002-5009-5445 http://orcid.org/0000-0002-9384-5250 |
Keywords |
thin films resistivity reflection coefficient тонкі плівки питомий опір коефіцієнт відбиття тонкие пленки удельное сопротивление коэффициент отражения |
Type | Article |
Date of Issue | 2006 |
URI | http://essuir.sumdu.edu.ua/handle/123456789/583 |
Publisher | WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim |
License | |
Citation | Hovorun T. Thin overlayer influence on electrophysical properties of nickel films [Text] / T. Hovorun, A. Chornous // Cryst. Res. Technol. 41, No 5, 458 - 463 (2006). |
Abstract |
In this work it is experimentally investigated a size effect in temperature coefficient of resistance (TCR) of Ni films with Cu and Si02 thin overiayer. The parameters of electrical transfer (the mean-free path of electron, the reflectivity coefficient of the external surfaces, the reflection and transmission coefficients at the grain boundary) were calculations. Decreasing of the value of the reflectivity coefficient is due to the change of the surface microrelief. It is show that the value of TCR decreases caused by the conditions of scattering changes on internal and external boundaries.
When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/583 |
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