Electromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modeling
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Date
2021
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Department of Physics and Astronomy of the National Academy of Sciences of Ukraine
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Abstract
he epitaxial growth of thin films with regard for the anisotropy of the adsorbate surface dif-fusion induced by electromigration effects has been studied theoretically in the framework ofthe phase-field theory and with the use of numerical simulations. The influence of the coef-ficient of electromigration-induced anisotropic diffusion, which is proportional to the appliedelectric field strength, on the dynamics of growth of the film thickness and the height of sur-face structures, growing surface morphology, statistical characteristics of the surface multilayeradsorbate structures, and distribution of surface structures over their heights is revealed.
Keywords
hase-field method, epitaxial growth, surface structures, electromigration, numerical simulation, statistical characteristics
Citation
Dvornichenko, A. (2021). Electromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modeling. Ukrainian Journal of Physics, 66(5), 439. https://doi.org/10.15407/ujpe66.5.439