Laser scribing optimization of RF magnetron sputtered molybdenum thin films

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Title	Laser scribing optimization of RF magnetron sputtered molybdenum thin films
Authors	Padhiar, V.B. Patel, A.L. Ray, J.R. Desai, M.S. Panchal, C.J.
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Keywords	laser scribing molybdenum thin film laser power pulse frequency scribe line width
Type	Article
Date of Issue	2011
URI	http://essuir.sumdu.edu.ua/handle/123456789/9294
Publisher	Sumy State University Publishing
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Citation	V.B. Padhiar, A.L. Patel, J.R. Ray, et al., J. Nano- Electron. Phys. 3 No1, 9 (2011)
Abstract	The optimization process of laser scribing of back contacts is carried out by varying different parameters of laser and thickness of Molybdenum (Mo) thin-films. Mo thin films were deposited by RF magnetron sputtering on the organically cleaned soda lime glass substrate. The thickness of Mo was in the range of 60 nm to 800 nm. For the scribing process the laser power and the laser pulse frequency were varied. Different thickness of Mo shows the different scribe behavior. The optimized process provides a successful isolative laser scribing, having a minimum scribe line width, of Mo layer on glass substrate without any presence of walls, ridges, or collars in scribed areas. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/9294
Appears in Collections:	Журнал нано- та електронної фізики (Journal of nano- and electronic physics)