Structure and Properties NbN and Nb-Si-N Deposited by Magnetron Sputtering
No Thumbnail Available
Date
2014
Journal Title
Journal ISSN
Volume Title
Publisher
Sumy State University
Article
Date of Defense
Scientific Director
Speciality
Date of Presentation
Abstract
NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltage, Us. The films were investigated by an atomic force microscope (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and nanoindentation. The deposited films were annealed to establish their thermal stability. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of δ-NbNx nanocrystallites embedded into the amorphous Si3N4 tissue (nc-δ-NbNx/a-Si3N4).
Keywords
AFM, XRD, NbN, Nb-Si-N, XPS
Citation
Proc. NAP 3, 01NTF22 (2014)