Structure and Properties NbN and Nb-Si-N Deposited by Magnetron Sputtering

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Title	Structure and Properties NbN and Nb-Si-N Deposited by Magnetron Sputtering
Authors	Ivashchenko, V.I. Scrynskyy, P.L. Lytvyn, O.S. Rogoz, V.M. Sobol, O.V. Kuzmenko, A.P.
ORCID
Keywords	AFM XRD NbN Nb-Si-N XPS
Type	Article
Date of Issue	2014
URI	http://essuir.sumdu.edu.ua/handle/123456789/37153
Publisher	Sumy State University
License	Copyright not evaluated
Citation	Proc. NAP 3, 01NTF22 (2014)
Abstract	NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltage, Us. The films were investigated by an atomic force microscope (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and nanoindentation. The deposited films were annealed to establish their thermal stability. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of δ-NbNx nanocrystallites embedded into the amorphous Si3N4 tissue (nc-δ-NbNx/a-Si3N4).
Appears in Collections:	Наукові видання (ЕлІТ)