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Title | Structure and Properties NbN and Nb-Si-N Deposited by Magnetron Sputtering |
Authors |
Ivashchenko, V.I.
Scrynskyy, P.L. Lytvyn, O.S. Rogoz, V.M. Sobol, O.V. Kuzmenko, A.P. |
ORCID | |
Keywords |
AFM XRD NbN Nb-Si-N XPS |
Type | Article |
Date of Issue | 2014 |
URI | http://essuir.sumdu.edu.ua/handle/123456789/37153 |
Publisher | Sumy State University |
License | |
Citation | Proc. NAP 3, 01NTF22 (2014) |
Abstract |
NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltage, Us. The films were investigated by an atomic force microscope (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and nanoindentation. The deposited films were annealed to establish their thermal stability. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of δ-NbNx nanocrystallites embedded into the amorphous Si3N4 tissue (nc-δ-NbNx/a-Si3N4). |
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File | Size | Format | Downloads |
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Іvashchenko_Scrynskyy_Lytvyn_Rogoz_Sobol_Kuzmenko.pdf | 896.59 kB | Adobe PDF | -1830959629 |
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