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Title Structure and Properties NbN and Nb-Si-N Deposited by Magnetron Sputtering
Authors Ivashchenko, V.I.
Scrynskyy, P.L.
Lytvyn, O.S.
Rogoz, V.M.
Sobol, O.V.
Kuzmenko, A.P.
Keywords AFM
XRD
NbN
Nb-Si-N
XPS
Type Article
Date of Issue 2014
URI http://essuir.sumdu.edu.ua/handle/123456789/37153
Publisher Sumy State University
License
Citation Proc. NAP 3, 01NTF22 (2014)
Abstract NbN and Nb-Si-N films were deposited by magnetron sputtering the Nb and Si targets on silicon wafers at various bias voltage, Us. The films were investigated by an atomic force microscope (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and nanoindentation. The deposited films were annealed to establish their thermal stability. The NbN films were nanostructured, and the Nb-Si-N films had a nanocomposite structure, and represented an aggregation of δ-NbNx nanocrystallites embedded into the amorphous Si3N4 tissue (nc-δ-NbNx/a-Si3N4).
Appears in Collections: Наукові видання (ЕлІТ)

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