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Title Thermal conditions of technological plasma sources cathodes
Authors Sysoiev, Yu.A.
Tsaglov, А.I.
Khaustova, А.N.
ORCID
Keywords Vacuum-arc plasma source cathode
Plasma flow composition
Plasma flow composition
Cathode stationary thermal field
Time to reach stationary thermal regime.
Type Article
Date of Issue 2014
URI http://essuir.sumdu.edu.ua/handle/123456789/37155
Publisher Sumy State University
License
Citation Proc. NAP 3, 01NTF03 (2014)
Abstract Were determined thermal conditions of vacuum-arc plasma sources cathodes.Stationary thermal field of the cathode with refrigeration was researched along both later a landend surfaces having different geometry of cathodes and thermal flows onto the operating surfaces.Was detected non uniformity of cathode operational surface temperature distribution along its radius. This non uniformity is greater for the cathode with refrigeration along the side surface and it can be minimized to several degrees range by changing the geometry of the cathode.Weredetermined time periods for cathodes with different refrigeration types reaching stationary thermal regime depending on cathodes’ geometry and arc current.
Appears in Collections: Наукові видання (ЕлІТ)

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